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Proceedings Paper

Photochemical batches: E0 modelling and applications
Author(s): James S. Lekas; James C. Pew; Mark A. Wirzbicki
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Paper Abstract

Experimental investigations into long term process variability at Digital's FAB4 facility indicated batch to batch changes in photochemicals were a significant contributor to process variation. The individual resist and developer batches themselves were within photospeed specifications: however, certain combinations of the two chemicals occasionally resulted in an out of spec condition. A study was undertaken to investigate this phenomenon. The work commenced with an extensive photospeed measurement capability study between the supplier and Digital. Upon completion of the capability work a statistically designed experiment was defined to investigate `system' photospeed. The experiment involved examining the resultant photospeed for all possible combinations of five individual resist and developer batches. Each resist and developer batch was manufactured to a unique photospeed target with values selected to cover and exceed the current photospeed specifications for each of the individual chemicals. The experimental results led to the development of a photochemical batch EO model which defined resultant photospeed as a function of the individual resist/developer batch photospeeds.

Paper Details

Date Published: 1 May 1994
PDF: 12 pages
Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174143
Show Author Affiliations
James S. Lekas, Digital Equipment Corp. (United States)
James C. Pew, Digital Equipment Corp. (United States)
Mark A. Wirzbicki, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 2196:
Integrated Circuit Metrology, Inspection, and Process Control VIII
Marylyn Hoy Bennett, Editor(s)

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