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Proceedings Paper

Moire interferometric alignment and overlay techniques
Author(s): Saleem H. Zaidi; Andrew Frauenglass; Steven R. J. Brueck
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Paper Abstract

Moire alignment and overlay measurement techniques with nm-scale precision are demonstrated. Using 0.47-micrometers pitch gratings, a 1-nm alignment resolution is demonstrated. A novel double-period moire grating is used to provide both coarse (approximately 10 micrometers ) and fine (approximately 1 micrometers ) capture ranges for integration with existing stage positioning systems. A new diffraction-order interferometry technique for nm-precision remote overlay readout, with potential application to latent image structures immediately after exposure, is demonstrated.

Paper Details

Date Published: 1 May 1994
PDF: 12 pages
Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174139
Show Author Affiliations
Saleem H. Zaidi, Univ. of New Mexico (United States)
Andrew Frauenglass, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 2196:
Integrated Circuit Metrology, Inspection, and Process Control VIII
Marylyn Hoy Bennett, Editor(s)

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