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Proceedings Paper

Martensitic transformation in Ni50Ti50 films
Author(s): Quanmin Su; Susan Z. Hua; Manfred R. Wuttig
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Paper Abstract

The elasticity and anelasticity of Ni50Ti50 films deposited on Si substrates was studied yielding information on the damping and modulus softening. It was found that the transformation behavior strongly depends on the film thickness and approaches bulk Ni50Ti50 behavior as the film becomes a few micrometers thick. For the same film thickness, the transformation depends on the film/substrate adhesion. In films with good adhesion cross sectional transmission electron microcopy (TEM) reveals a thin parent phase layer which does not transform while the bulk part of the Ni50Ti50 film transforms. It is thus proposed that interface constraints stabilize the B2 structure. A microscopic interpretation in terms of transformation strains at the interface is given.

Paper Details

Date Published: 1 May 1994
PDF: 4 pages
Proc. SPIE 2189, Smart Structures and Materials 1994: Smart Materials, (1 May 1994); doi: 10.1117/12.174077
Show Author Affiliations
Quanmin Su, Univ. of Maryland/College Park (United States)
Susan Z. Hua, Univ. of Maryland/College Park (United States)
Manfred R. Wuttig, Univ. of Maryland/College Park (United States)


Published in SPIE Proceedings Vol. 2189:
Smart Structures and Materials 1994: Smart Materials
Vijay K. Varadan, Editor(s)

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