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Proceedings Paper

Novel technique for performing ellipsometric measurements in a submicrometer area
Author(s): Jeffrey T. Fanton; Jon L. Opsal; Allan Rosencwaig; David Willenborg
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Paper Abstract

We have developed a novel technique for performing simple phase-sensitive optical measurements in a sub-micrometer area. We presently use this technique to measure film stacks commonly found in the semiconductor industry. This article explains the theory behind this technique and presents several examples demonstrating the capabilities of the system.

Paper Details

Date Published: 1 March 1994
PDF: 11 pages
Proc. SPIE 2004, Interferometry VI: Applications, (1 March 1994); doi: 10.1117/12.172605
Show Author Affiliations
Jeffrey T. Fanton, Therma-Wave, Inc. (United States)
Jon L. Opsal, Therma-Wave, Inc. (United States)
Allan Rosencwaig, Therma-Wave, Inc. (United States)
David Willenborg, Therma-Wave, Inc. (United States)


Published in SPIE Proceedings Vol. 2004:
Interferometry VI: Applications
Ryszard J. Pryputniewicz; Gordon M. Brown; Werner P. O. Jueptner, Editor(s)

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