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Proceedings Paper

Yield enhancement: photomask pellicles for use in flat panel display lithography
Author(s): Gilbert Hong; Patrick St. Cin
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Paper Abstract

Pellicles have been used on photomasks in the semiconductor industry for the past ten years as a means to enhance wafer yields. An overview of pellicle technology and yield improvements for the semiconductor industry will be presented. Single die reticles are used in both the semiconductor and display lithography; similar and dissimilar aspects of the use of pellicles between these two industries will be presented. The application of pellicles specific to display lithography will be presented as a means of enhancing yields.

Paper Details

Date Published: 1 April 1994
PDF: 8 pages
Proc. SPIE 2174, Advanced Flat Panel Display Technologies, (1 April 1994); doi: 10.1117/12.172153
Show Author Affiliations
Gilbert Hong, Exion Technology, Inc. (United States)
Patrick St. Cin, Exion Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 2174:
Advanced Flat Panel Display Technologies
Peter S. Friedman, Editor(s)

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