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Proceedings Paper

Replication of diffractive optics
Author(s): Felix P. Shvartsman
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Paper Abstract

In recent years surface-relief Diffractive Optical Elements (DOEs), a specialized class of diffractive optical elements, have revolutionized design of optical systems and instruments. Surface-relief diffractive optical components improve performance of the existing optical systems and increase systems compactness and reliability. Surface-relief DOEs can be fabricated as multilevel binary optical elements, or as continuous surface-relief optical elements. A surface-relief DOE is being designed such that incident light interacts with the topography of the surface-relief microstructure including the size and shape characteristics of surface profile features such as indentations and projections as well as their dimensional relationship, to perform a desired optical function. Binary optical elements are being made by the same microlithographic and ion etching techniques used to produce VLSI circuits. Computer-generated continuous surface-relief DOE is recorded by direct laser-beam or e-beam writing in photoresist. Continuous surface-relief DOE can be also recorded in photoresist by interferometric (holographic) technique. After development recorded in photoresist surface-relief microstructures are being ion-beam etched into quartz or other inorganic optical substrates.

Paper Details

Date Published: 28 December 1993
PDF: 22 pages
Proc. SPIE 10271, Diffractive and Miniaturized Optics: A Critical Review, 102710A (28 December 1993); doi: 10.1117/12.170198
Show Author Affiliations
Felix P. Shvartsman, E.I. du Pont de Nemours & Co., Inc. (United States)


Published in SPIE Proceedings Vol. 10271:
Diffractive and Miniaturized Optics: A Critical Review
Sing H. Lee, Editor(s)

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