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Proceedings Paper

Diffractive optics fabricated by electron-beam direct write methods
Author(s): D. Zaleta; Walter Daeschner; J. Michael Larsson; Bernard C. Kress; Jiao Fan; Kristopher S. Urquhart; Sing H. Lee
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Paper Abstract

Due to the stringent requirements on the lateral alignment and the large number of steps required to fabricate diffractive optics by typical microlithographic techniques, the need for more efficient methods to fabricate these elements has arisen. This paper discusses the use of electron beam lithography in fabricating diffractive optical elements by direct e-beam alignment and direct write into the electron beam resist. Many of the practical advantages and disadvantages of each method will be pointed out. In particular, current research and future research directions into such direct write problems as the proximity effect, hologram ruggedness, and lengthy exposure times will be addressed.

Paper Details

Date Published: 28 December 1993
PDF: 21 pages
Proc. SPIE 10271, Diffractive and Miniaturized Optics: A Critical Review, 1027108 (28 December 1993); doi: 10.1117/12.170196
Show Author Affiliations
D. Zaleta, Univ. of California, San Diego (United States)
Walter Daeschner, Univ. of California, San Diego (United States)
J. Michael Larsson, Univ. of California, San Diego (Sweden)
Bernard C. Kress, Univ. of California, San Diego (United States)
Jiao Fan, Univ. of California, San Diego (United States)
Kristopher S. Urquhart, Univ. of California, San Diego (United States)
Sing H. Lee, Univ. of California, San Diego (United States)


Published in SPIE Proceedings Vol. 10271:
Diffractive and Miniaturized Optics: A Critical Review
Sing H. Lee, Editor(s)

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