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Proceedings Paper

Design and fabrication of a reflection far-ultraviolet polarizer and retarder
Author(s): Jongmin Kim; Muamer Zukic; Michele M. Wilson; Douglas G. Torr
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Paper Abstract

New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF2/Al/MgF2 three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.

Paper Details

Date Published: 15 February 1994
PDF: 11 pages
Proc. SPIE 2010, X-Ray and Ultraviolet Polarimetry, (15 February 1994); doi: 10.1117/12.168569
Show Author Affiliations
Jongmin Kim, Univ. of Alabama in Huntsville (United States)
Muamer Zukic, Univ. of Alabama in Huntsville (United States)
Michele M. Wilson, Univ. of Alabama in Huntsville (United States)
Douglas G. Torr, Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 2010:
X-Ray and Ultraviolet Polarimetry
Silvano Fineschi, Editor(s)

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