Share Email Print

Proceedings Paper

Ealing Schwarzschild microscope using 50 to 60 nm illumination from a laser plasma EUV source
Author(s): Lan Sun; Gary A. Sweezey; William T. Silfvast
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The construction of an extreme ultraviolet reflection imaging microscope at CREOL using an Ealing Schwarzschild objective and a laser-produced plasma source is summarized. Proposed operation of the present system in the 50 - 60 nm wavelength region is discussed.

Paper Details

Date Published: 1 February 1994
PDF: 10 pages
Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.168013
Show Author Affiliations
Lan Sun, CREOL/Univ. of Central Florida (United States)
Gary A. Sweezey, CREOL/Univ. of Central Florida (United States)
William T. Silfvast, CREOL/Univ. of Central Florida (United States)

Published in SPIE Proceedings Vol. 2015:
Applications of Laser Plasma Radiation
Martin C. Richardson, Editor(s)

© SPIE. Terms of Use
Back to Top