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Proceedings Paper

Thermal stability of Mo-based multilayer x-ray mirrors
Author(s): Yoshikazu Ishii; Hisataka Takenaka; Tomoaki Kawamura; Tsuneyuki Haga; Hiroo Kinoshita
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Paper Abstract

Mo-based multilayers show high reflectivities in the 8 - 20 nm region at normal incidence. We have evaluated the soft x-ray reflectivities and the effects of thermal annealing on both reflectivity and the layered structures of these Mo-based multilayers. The Cu-K (alpha) x-ray first-order Bragg-peak reflectivity of the Mo/Si multilayer markedly decreases at annealing temperatures above 400 degree(s)C. TEM observation reveals that the thermally induced deteriorations of Mo/B4C and Mo/SiC multilayers are smaller than those of the Mo/Si multilayer. The Mo/Si multilayer reflectivity at a wavelength of about 13 nm decreases greatly with 600 degree(s)C annealing. However, the Mo/B4C and Mo/SiC multilayers maintain higher reflectivities at the same wavelength. These results suggests that the Mo/B4C and Mo/SiC multilayers are superior to a Mo/Si multilayer in terms of thermal stability.

Paper Details

Date Published: 1 February 1994
PDF: 10 pages
Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.167991
Show Author Affiliations
Yoshikazu Ishii, NTT Interdisciplinary Research Labs. (Japan)
Hisataka Takenaka, NTT Interdisciplinary Research Labs. (Japan)
Tomoaki Kawamura, NTT Interdisciplinary Research Labs. (Japan)
Tsuneyuki Haga, NTT LSI Labs. (Japan)
Hiroo Kinoshita, NTT LSI Labs. (Japan)


Published in SPIE Proceedings Vol. 2015:
Applications of Laser Plasma Radiation
Martin C. Richardson, Editor(s)

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