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Proceedings Paper

Laser and pinch plasma x-ray sources for microscopy and lithography
Author(s): Willi Neff; D. Rothweiler; Klaus Eidmann; Rainer Lebert; Franz Richter; G. Winhart
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Paper Abstract

Experimental results on radiative properties of laser produced and pinch plasmas are discussed in comparison and with respect to the specific sets of requirements defined by proximity printing x-ray lithography and full field imaging x-ray microscopy.

Paper Details

Date Published: 1 February 1994
PDF: 13 pages
Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.167990
Show Author Affiliations
Willi Neff, Fraunhofer-Institut fuer Lasertechnik (Germany)
D. Rothweiler, RWTH-Lehrstuhl fuer Lasertechnik (Germany)
Klaus Eidmann, Max-Planck-Institut fuer Quantenoptik (Germany)
Rainer Lebert, RWTH-Lehrstuhl fuer Lasertechnik (Germany)
Franz Richter, Karl Suess KG (Germany)
G. Winhart, Max-Planck-Institut fuer Quantenoptik (Germany)

Published in SPIE Proceedings Vol. 2015:
Applications of Laser Plasma Radiation
Martin C. Richardson, Editor(s)

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