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Proceedings Paper

Synchrotron beamlines for x-ray lithography
Author(s): Anthony P. Trippe; W. Jorge Pearce
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Paper Abstract

Louisiana State University established the J. Bennett Johnston, Sr., Center for Advanced Microstructures and Devices (CAMD). Designed and constructed by the Brobeck Division of Maxwell Laboratories, the CAMD synchrotron light source is the first electron storage ring to be built by a commercial company in the United States. The synchrotron x-ray radiation generated at CAMD is an extremely useful exposure source for both thin and thick film lithography. Passing through a beamline containing two plane mirrors, the synchrotron light is used to expose thin resists for lithography of patterns with feature sizes of 0.25 micron and smaller. Two thick-resist beamlines, one using a single aspheric (collimating) mirror and one using a plane mirror, provide the higher flux photons required for miniaturization in silicon to produce microscopic mechanical devices including gears, motors, filters, and valves.

Paper Details

Date Published: 1 February 1994
PDF: 6 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167572
Show Author Affiliations
Anthony P. Trippe, Maxwell Labs., Inc. (United States)
W. Jorge Pearce, Maxwell Labs., Inc. (United States)

Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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