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Proceedings Paper

Iron silicide formation by excimer laser pulses
Author(s): Armando Luches; Emilia D'Anna; Gilberto Leggieri; Stefan Luby; Eva Majkova; Guiseppe Majni; Paolo Mengucci
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Paper Abstract

We report the synthesis of iron silicide layers by multipulse excimer (XeCl) laser irradiation of Si/Fe bilayers (50 and 90 nm thick, respectively) deposited on single crystal silicon wafers. A mixture of iron silicide phases is usually formed after a few hundreds of laser pulses at the fluence of 0.5 J/cm2 with a repetition rate of 50 Hz. After thousand pulses the high- temperature stable (alpha) -FeSi2 silicide forms.

Paper Details

Date Published: 1 February 1994
PDF: 12 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167560
Show Author Affiliations
Armando Luches, Univ. di Lecce (Italy)
Emilia D'Anna, Univ. di Lecce (Italy)
Gilberto Leggieri, Univ. di Lecce (Italy)
Stefan Luby, Institute of Physics (Slovak Republic)
Eva Majkova, Institute of Physics (Slovak Republic)
Guiseppe Majni, Univ. di Ancona (Italy)
Paolo Mengucci, Univ. di Ancona (Italy)

Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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