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Proceedings Paper

UV routes for approaching low temperature dielectrics deposition in III-V technology
Author(s): Jean Flicstein; B. Leon; Ian W. Boyd
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Paper Abstract

As a `cold process' photochemical deposition enables us to obtain insulator and dielectric thin films on III-V compounds. To sustain the remarkable progress in the performance of electronic and optical devices may necessitate the utilization of this innocuous processing for novel applications. Possible areas of interest range from simply optically protective coating to layers for highly sophisticated optoelectronic integration of III-V and Si on the same chip.

Paper Details

Date Published: 1 February 1994
PDF: 14 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167555
Show Author Affiliations
Jean Flicstein, CNET (France)
B. Leon, Univ. de Vigo (Spain)
Ian W. Boyd, Univ. College London (United Kingdom)


Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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