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Proceedings Paper

Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist
Author(s): Michael T. Gale; Markus Rossi; Helmut Schuetz
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Paper Abstract

Progress in the fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of micro-optical elements to be fabricated and replicated using Ni shims electroformed from the photoresist originals. Examples of fabricated micro- optical elements are described, including microlens arrays, Fresnel microlenses, kinoforms, and other continuous microrelief phase elements.

Paper Details

Date Published: 1 February 1994
PDF: 9 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167542
Show Author Affiliations
Michael T. Gale, Paul Scherrer Institute (Switzerland)
Markus Rossi, Paul Scherrer Institute (Switzerland)
Helmut Schuetz, Paul Scherrer Institute (Switzerland)


Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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