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Proceedings Paper

Manufacturing parameters of large-batch, small-batch, and single-wafer cluster tools for poly-gate applications
Author(s): Marinus A. van Driel
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Paper Abstract

In this paper a number of cluster tool concepts will be analyzed to compare numbers such as throughput, cycle time and cost per wafer. This will be done for two of the most frequently used reactor concepts, viz. for single wafer and batch type reactors, and for a number of ambient control concepts. For demonstration purposes, a polysilicon gate process flow will be used, as the process steps involved belong in the class of critical processes in advanced CMOS manufacturing lines.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167368
Show Author Affiliations
Marinus A. van Driel, ASM International NV (Netherlands)

Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; James A. Bondur; James A. Bondur; Kiefer Elliott; John R. Hauser; John R. Hauser; Dim-Lee Kwong; Asit K. Ray, Editor(s)

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