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Proceedings Paper

On-line optimization of stop-etch time
Author(s): Songling Cao; R. Russell Rhinehart
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Paper Abstract

Two separate modeling approaches are shown to be able to estimate the spatially local end point time distribution of a plasma etch, from nonochromatic emission data, before the etch is complete. The distribution can be used to determine optimum stop-etch time.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167361
Show Author Affiliations
Songling Cao, Texas Tech Univ. (United States)
R. Russell Rhinehart, Texas Tech Univ. (United States)


Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; James A. Bondur; James A. Bondur; Kiefer Elliott; John R. Hauser; John R. Hauser; Dim-Lee Kwong; Asit K. Ray, Editor(s)

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