Share Email Print
cover

Proceedings Paper

Run-to-run control framework for VLSI manufacturing
Author(s): James R. Moyne; Hossein Etemad; Michael E. Elta
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A run-to-run (R2R) control framework has been developed for application to supervisory control of semiconductor manufacturing processes. This generic framework, which is being developed for eventual transfer to industry, is one component of a multi-level control system that includes real-time equipment and process control as well as pseudo-real-time process control elements operating in conjunction with the R2R controller. The framework is compliant with existing trends and standards in industry. At the heart of the framework is a generic cell controller implementation that serves to support the R2R control algorithm and coordinate control and information flow between the various R2R control modules. This implementation provides for the easy incorporation of commercially available software into the control scheme.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167358
Show Author Affiliations
James R. Moyne, Univ. of Michigan (United States)
Hossein Etemad, Univ. of Michigan (United States)
Michael E. Elta, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; John R. Hauser; James A. Bondur; Kiefer Elliott; John R. Hauser; Dim-Lee Kwong; Asit K. Ray; James A. Bondur, Editor(s)

© SPIE. Terms of Use
Back to Top