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Proceedings Paper

Real-time image analysis and control of the solid/liquid interface during zone-melting recrystallization of thin films
Author(s): Peter Y. Wong; Ioannis N. Miaoulis
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Paper Abstract

Thermal processing, a necessary step in the fabrication of most microelectronic devices, is used to improve the material quality of thin films. One example of thermal processing of thin films is Zone- Melting Recrystallization with a radiant line heat source. A line heater, situated above the film, heats a narrow region beyond its melt point creating a molten zone. As the line heater is moved slowly over the film, the material in the wake of the moving molten zone freezes in the form of a single crystal. The morphology of the solid/liquid interface strongly influences the resultant quality of the crystal. A planar morphology, in fact, produces a poor quality film which contains branching dislocations. A cellular morphology produces the highest quality films with limited point of line defects. In-situ observations of the crystalline quality can be made by examining the solid/liquid interface morphology. The real-time image analysis of the interface and the closed-loop control of the process are described in this paper.

Paper Details

Date Published: 15 February 1994
PDF: 11 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167356
Show Author Affiliations
Peter Y. Wong, Tufts Univ. (United States)
Ioannis N. Miaoulis, Tufts Univ. (United States)

Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; James A. Bondur; James A. Bondur; Kiefer Elliott; John R. Hauser; John R. Hauser; Dim-Lee Kwong; Asit K. Ray, Editor(s)

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