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Proceedings Paper

Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography
Author(s): Victor V. Boksha; Anatoly I. Sharendo; Vyjacheslav E. Obukhov; Eduard I. Tochitsky
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Paper Abstract

Aberration research in the optic system was conducted by finding possible angles between the axis of the illuminator and a lens on the basis of the analysis of intensity on the image plane. Intensity distribution was drawn after calculation of aberration deformations of the wave front. Quality of the image of three lines with crosscut size of 0.5, 1.0 and 3.0 micrometers on the margin of 5 X 5 mm field was investigated with the worse variant taken into account.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167332
Show Author Affiliations
Victor V. Boksha, Plasmoteg Engineering Ctr. (United States)
Anatoly I. Sharendo, Plasmoteg Engineering Ctr. (Belarus)
Vyjacheslav E. Obukhov, Plasmoteg Engineering Ctr. (Belarus)
Eduard I. Tochitsky, Plasmoteg Engineering Ctr. (Belarus)


Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; John R. Hauser; James A. Bondur; Kiefer Elliott; John R. Hauser; Dim-Lee Kwong; Asit K. Ray; James A. Bondur, Editor(s)

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