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Proceedings Paper

Comparison of state-of-the-art lithography tools
Author(s): Richard W. Aprile
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Paper Abstract

The concept of Cpk has been a long accepted method for indicating manufacturing process capability and making critical judgments about expected performance. Within this paper Cpk's are calculated for a set of test masks generated by divergent photomask lithography tools. The MSTM (Manufacturing Simulation Test Mask) uses different address sizes (1.0, 0.5, 0.25, and 0.1 micrometers ) allowing all address structures to be tested on the same mask. A Leica LMS- 2000 was used for the registration measurements. Through critical observation of the data sets' mean and range variance, an insight about contributing error sources is gained and a common ground for unbiased comparison is found.

Paper Details

Date Published: 15 February 1994
PDF: 6 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167284
Show Author Affiliations
Richard W. Aprile, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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