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Proceedings Paper

Practical approach to 0.35-um i-line lithography
Author(s): Etsuya Morita
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Paper Abstract

LithoGraphTM, a PC-based lithography simulation software package developed by Etec Systems, is examined for its ability to be a useful tool in lithography process development. We evaluated conventional binary masks, attenuated phase shift masks (PSMs), alternate PSMs, and quadrupole illumination techniques at varying stepper parameters. As boundary conditions for the optimization, we considered image contrast, exposure-defocus latitude, exposure dose level, and optical proximity corrections. To quantify the extent of optical proximity effects, we calculated the overall exposure latitude by overlapping exposure-defocus diagrams generated at various pattern pitches.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167283
Show Author Affiliations
Etsuya Morita, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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