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Proceedings Paper

New simple method of extending the limit of rim phase-shift mask
Author(s): Seong-Woon Choi; Sang-Gyun Woo; Jin-Min Kim; Jongmin Son; Jeong Gey Lee
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Paper Abstract

Even though rim PSM, unlike Levenson Phase Shift Mask, has no design restriction that neighboring patterns should be altered, its benefit is modest in both resolution and DOF enhancement, which masks it difficult to be applied to high resolution patterns. In order to improve the performance of rim PSM, we propose a new simple method called rim+ATOM, which combines rim PSM with ATOM (Advanced Tilted illumination On Mask). By combining rim PSM with ATOM, we could obtain resolution improvement by 20% compared to that of rim PSM with i-line stepper (5X, NA equals 0.45). And rim+ATOM showed less pattern degradation than ATOM for 45 degree patterns.

Paper Details

Date Published: 15 February 1994
PDF: 8 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167279
Show Author Affiliations
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Jin-Min Kim, Samsung Electronics Co., Ltd. (South Korea)
Jongmin Son, Samsung Electronics Co., Ltd. (South Korea)
Jeong Gey Lee, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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