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Proceedings Paper

Cost of ownership for soft x-ray projection lithography
Author(s): Kathleen Early; William H. Arnold
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Paper Abstract

We present a general analysis of cost of ownership for an integrated circuit production lithography system. We illustrate the method with examples from i-line and deep ultraviolet lithography, as well as soft x-ray projection lithography. Tool utilization is emphasized as well as system throughput. Our analysis suggests that with 20 wafer per hour throughput, which may be attainable with soft x-ray projection lithography, lithography costs will rise to four times today's i-line costs, or higher. In addition to throughput, reticles and photoresist will be cost drivers for this technology.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167276
Show Author Affiliations
Kathleen Early, Advanced Micro Devices, Inc. (United States)
William H. Arnold, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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