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Proceedings Paper

LAN integration of photomask tools at IBM Burlington using the IBMRISC/6000
Author(s): Edward J. Wilbur
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Paper Abstract

IBM Burlington has made the transition from a purely IBM MVS Host based architecture for writing and inspecting photomasks to an innovative hybrid host and local area network (LAN) solution. This involved going from a pure 9 track host generated tape environment to a IBM RISC/6000 LAN solution. An 80% tape reduction has been realized to date. Other IBM sites utilizing the same architecture include IBM Essonnes, France; IBM San Jose, CA and IBM Rochester, MN. The transition of the IBM Burlington photomask operational environment will be detailed to show the migration from tape to LAN for current and new equipment. Decision points and rationale that were used in the process will be given.

Paper Details

Date Published: 15 February 1994
PDF: 7 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167273
Show Author Affiliations
Edward J. Wilbur, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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