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Proceedings Paper

Characterization of defect sizing on an automatic inspection system (KLA238e)
Author(s): Dave Stocker; Brian Martin; Jeffrey O. Browne
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Paper Abstract

This paper describes the calibration of an automatic inspection system to size 5X reticle defects down to half-micron resolution, the defect printability limit of the stepper lens with which the 5X reticles are to be used. An enhanced technique using image analysis for defect sizing is also described. Whilst enabling more accurate defect sizing, this method is resolution limited in automatic operation.

Paper Details

Date Published: 15 February 1994
PDF: 6 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167271
Show Author Affiliations
Dave Stocker, GEC Plessey Semiconductors Ltd. (United Kingdom)
Brian Martin, GEC Plessey Semiconductors Ltd. (United Kingdom)
Jeffrey O. Browne, GEC Plessey Semiconductors Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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