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Proceedings Paper

Printability of phase-shift defects using a perturbational model
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Paper Abstract

A perturbational model which describes the printability of defects in phase-shift masks (PSM) as a function of focus position is presented and used along with the SPLAT to generate design data on tolerable defect size as a function of defect phase. Defects in a clear field mask with phases other than 180 degrees have the greatest tendency to print when out of focus. From a reformulation of the perturbational model, the tendency to print when out of focus can be explained by the combination of the phase contributed by defocus in the defect image with the phase of the light passing through the defect. To assess the printability of defects, the impact of defects near features in thin chrome attenuating PSM and embedded attenuating PSM were evaluated by calculating the image linewidth variation.

Paper Details

Date Published: 15 February 1994
PDF: 11 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167269
Show Author Affiliations
Robert John Socha, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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