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Proceedings Paper

Recent advances in focused ion beam repair of phase-shifting masks
Author(s): John C. Morgan
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Paper Abstract

The introduction of phase shift masks presents a great challenge in the area of defect repair. Previously the number of variables was small. Defects consisted of extra chrome or missing chrome. These were either sputtered away or an opaque deposition was created to take the place of the missing chrome. These repairs really only had to be accurate in two dimensions-- X and Y. The Z dimension was somewhat important--it is necessary to remove all the chrome and not create significant glass damage--but the requirements were fairly loose. This has all changed with phase shift masks. The number of materials has doubled. We now must be concerned with missing and extra phase defects, and the Z dimension is immensely important and must be controlled to a few hundred Angstroms.

Paper Details

Date Published: 15 February 1994
PDF: 9 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167268
Show Author Affiliations
John C. Morgan, Micrion Corp. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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