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Proceedings Paper

PSM defect repair using currently available tools
Author(s): Roswitha Remling
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Paper Abstract

Phase shifting masks (PSMs) have proven to increase resolution in optical lithography. However, the production of defect free PSMs still remains a challenge. The increase in resolution not only decreases the maximum allowed chromium defect size, but also introduces phase defects which print at even smaller sizes than conventional defects. This paper will describe typical defects on quartz etched Rim shifting and Attenuated PSMs as well as the minimum requirements for repairing these defects during the process development phase. Finally, possible PSM repair methods using conventional mask repair techniques such as focused ion beam sputtering and laser ablation will be discussed.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167266
Show Author Affiliations
Roswitha Remling, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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