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Proceedings Paper

Die-to-die inspection of phase-shifting masks
Author(s): Doug J. Stolpe; Christophe Pierrat; Stephen D. Kirkish; Sheila Vaidya
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Paper Abstract

The evaluation of three different phase-shifting inspection test masks will be described. Each reticle was used to evaluate the defect detection capabilities on an automated inspection station for a different phase shifting technique. Two test reticles (alternate aperture and sized rim shifter) were fabricated using standard chromium on quartz blanks and one attenuated test reticle was made using thin chromium on a quartz blank provided by Hoya. A comprehensive study was conducted to determine the defect detection rates of phase defects achievable on these reticles using optimized settings for a KLA219HRL-PS automated inspection station. Results show that considerable gains in sensitivity and false detection reduction could be achieved using optimized settings, but phase defect detection and below 0.5 micrometers will require moving to the next generation tool.

Paper Details

Date Published: 15 February 1994
PDF: 16 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167262
Show Author Affiliations
Doug J. Stolpe, AT&T Bell Labs. (United States)
Christophe Pierrat, AT&T Bell Labs. (United States)
Stephen D. Kirkish, KLA Instruments Corp. (United States)
Sheila Vaidya, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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