Share Email Print
cover

Proceedings Paper

Basic improvements in the pellicle final clean area
Author(s): Donald M. Shernock; James Campi; Hector I. Garcia; Alan Golob
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In order to assure that only defect free masks will reach Hoya Micro Mask's customers we need clean water, an excellent cleaning system and, of course, the means to inspect the mask for lingering particles and to certify that the product is defect free within the customer's specifications. We have designed our own original method for checking the QC Optics API- 3000/5, for accuracy, precision and sensitivity by depositing a group of metallic points using our Seiko FIB and evenly spreading polystyrene spheres of various sizes over our test mask. The depositions provided a vehicle for determining the precision of the API-3000/5 and establishing defect placement. The polystyrene spheres determine the inspection system's accuracy and limits of detection. We have added to our cleaning capability by working together with Convac-APT in the design of a new state-of-the-art standalone cleaning system and have solved many of our water problems by introducing a custom designed point-of-use water treatment system.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167260
Show Author Affiliations
Donald M. Shernock, Hoya Micro Mask, Inc. (United States)
James Campi, Hoya Micro Mask, Inc. (United States)
Hector I. Garcia, Hoya Micro Mask, Inc. (United States)
Alan Golob, Hoya Micro Mask, Inc. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

© SPIE. Terms of Use
Back to Top