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Proceedings Paper

New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS
Author(s): Russell A. Budd; John L. Staples; Derek B. Dove
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Paper Abstract

The aerial image measurement system is an optical system for measurements on phase shift masks under chosen stepper characteristics of NA, sigma, wavelength and depth of focus. The present tool operates at I-line or DUV (248 nm) and commonly 5 or 6 inch reticles can be handled. The image obtained is optically equivalent to that incident on resist, but is highly magnified so that it can be recorded using an UV CCD camera. Typically, features of interest are recorded as a through focus series; image intensity is digitized and may be analyzed in a variety of ways so as to produce intensity contours or profiles. Combined with simple models for predicting resist behavior a great deal of information may be obtained on the expected printing performance of a given reticle as a function of intensity and depth of focus prior to actual resist tests.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167259
Show Author Affiliations
Russell A. Budd, IBM Research Div. (United States)
John L. Staples, IBM Research Div. (United States)
Derek B. Dove, IBM Research Div. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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