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Proceedings Paper

Application of an aerial image measurement system to mask fabrication and analysis
Author(s): Richard A. Ferguson; Ronald M. Martino; Russell A. Budd; John L. Staples; Lars W. Liebmann; Derek B. Dove; J. Tracy Weed
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Paper Abstract

Application of an Aerial Image Measurement System (AIMSTM) to binary and phase- shift mask fabrication and evaluation is described. The AIMS tool, an optical system which measures the aerial image directly from a mask, provides rapid feedback on lithographic performance for a variety of stepper configurations through modifications of the wavelength, numerical aperture, and illuminator design. The AIMS tool has been applied during the implementation of an alternating phase-shift mask (PSM) fabrication process in order to understand the impact of the etched-quartz sidewall on lithographic performance. AIMS measurements were used to extract the effective phase and transmission as a function of phase- etch depth as well as post-etch treatment condition. A set of basic test structures are proposed which can be used in conjunction with the AIMS tool to automate the extraction of transmission, phase, and second-level overlay for phase-shifting processes such as alternating and attenuating PSM.

Paper Details

Date Published: 15 February 1994
PDF: 14 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167256
Show Author Affiliations
Richard A. Ferguson, IBM Microelectronics (United States)
Ronald M. Martino, IBM Microelectronics (United States)
Russell A. Budd, IBM Corp. (United States)
John L. Staples, IBM Corp. (United States)
Lars W. Liebmann, IBM Microelectronics (United States)
Derek B. Dove, IBM Corp. (United States)
J. Tracy Weed, IBM Microelectronics (United States)

Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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