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Proceedings Paper

Dimensional metrology of phase-shifting masks with scanning probe microscopes
Author(s): Joseph E. Griffith; Herschel M. Marchman; Leslie C. Hopkins; Christophe Pierrat; Sheila Vaidya
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Paper Abstract

Critical dimension metrology of a phase-shifting mask must include depth as well as width measurements because both the phase and the lateral position of the transmitted photons must be controlled. Scanning probe microscopes are well suited to perform these measurements because they achieve high resolution simultaneously in all three dimensions. As with other microscopes, the probe-sample interaction strongly affects critical dimension measurement. The shape of the probe mixes with the measured object in an intrinsically nonlinear manner. We present measurements of phase-shifting masks performed with a scanning force microscope, and we discuss how they illustrate the capabilities and limitations of the technique.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167254
Show Author Affiliations
Joseph E. Griffith, AT&T Bell Labs. (United States)
Herschel M. Marchman, AT&T Bell Labs. (United States)
Leslie C. Hopkins, AT&T Bell Labs. (United States)
Christophe Pierrat, AT&T Bell Labs. (United States)
Sheila Vaidya, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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