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Proceedings Paper

Self-calibration in one dimension
Author(s): Michael T. Takac
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Paper Abstract

This document develops a 1D self-calibration method which calibrates a measuring tool with an uncalibrated artifact. The artifact is measured in more than one position, achieving a calibration that is approximately equal to the reproducibility of the measuring tool. The self- calibration method is targeted for the micro-lithography industry.

Paper Details

Date Published: 15 February 1994
PDF: 7 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167251
Show Author Affiliations
Michael T. Takac, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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