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Proceedings Paper

Masks for Markle-Dyson optics
Author(s): Andrew Grenville; Gerry Owen; Jeff A. Robinson; David Anthony Borkholder; Curtis W. Frank; Roger Fabian W. Pease; David A. Markle
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Paper Abstract

The optical performance of Markle-Dyson projection optics is now well established. Here we describe options for 1X reflective optical masks that might achieve the desired linewidth control. One option is the use of aluminum as the reflecting material. A film less than 50 nm thick has nearly twice the reflectivity of the silicon used until now, and so it should be possible to develop an etching process (for such a thin film) that is adequately precise. Moreover options exist for repairing both opaque and clear defects. An interesting alternative configuration, that eliminates the need to etch the aluminum, is to use a patterned absorber on the substrate and to deposit the aluminum over the patterned absorber.

Paper Details

Date Published: 15 February 1994
PDF: 8 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167246
Show Author Affiliations
Andrew Grenville, Stanford Univ. (United States)
Gerry Owen, Hewlett-Packard Co. (United States)
Jeff A. Robinson, IBM Microelectronics (United States)
David Anthony Borkholder, Stanford Univ. (United States)
Curtis W. Frank, Stanford Univ. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)
David A. Markle, Ultratech Stepper (United States)


Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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