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Proceedings Paper

Effects of heat load on the performance of a grating monochromator on an undulator beamline: simulation
Author(s): H. Raul Beguiristain; Masato Koike; Takeshi Namioka
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Paper Abstract

A new simulation method has been developed for evaluating the performance of a monochromator whose grating is exposed to intense undulator radiation. Analytic expressions for the thermally deformed surface figure and distorted groove pattern of the grating are determined first by a finite element method and then they are incorporated into a ray tracing procedure. The method is applied to a simple beamline optics consisting of a U3.9 undulator of the Advanced Light Source and a water-cooled metal grating to see whether this objective monochromator can stand for heat load without degrading its designed performance. The results show that the simulation method is capable of evaluating the performance of a thermally distorted grating and that the heat load would not cause any significant degradation in the spectral resolution and throughput.

Paper Details

Date Published: 1 February 1994
PDF: 6 pages
Proc. SPIE 2011, Multilayer and Grazing Incidence X-Ray/EUV Optics II, (1 February 1994); doi: 10.1117/12.167224
Show Author Affiliations
H. Raul Beguiristain, Lawrence Berkeley Lab (United States)
Masato Koike, Lawrence Berkeley Lab (United States)
Takeshi Namioka, NASA Goddard Space Flight Ctr. (United States)


Published in SPIE Proceedings Vol. 2011:
Multilayer and Grazing Incidence X-Ray/EUV Optics II
Richard B. Hoover, Editor(s)

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