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Proceedings Paper

Radical and molecular product concentration measurements in CF4 and CH4 RF plasmas by infrared tunable diode laser absorption
Author(s): Joda C. Wormhoudt
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Date Published: 1 January 1990
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Proc. SPIE 1185, Dry Processing for Submicrometer Lithography, (1 January 1990); doi: 10.1117/12.16709
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Joda C. Wormhoudt, Aerodyne Research, Inc. (United States)

Published in SPIE Proceedings Vol. 1185:
Dry Processing for Submicrometer Lithography
James A. Bondur; Alan R. Reinberg, Editor(s)

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