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Proceedings Paper

Fourier transform infrared spectroscopy as an analytical tool for etching investigations with silicon
Author(s): Andreas E. Guber; Uwe Koehler; W. Bier
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Paper Abstract

Silicon and its compounds (SiO2, Si3N4) were etched for microelectronic or micromechanical applications using different methods such as plasma etching processes, laser induced etching, or plasmaless etching processes. In our experiments, halogen containing gases, e.g., molecular fluorine or chlorine and interhalogen compounds such as JF5 or ClF3 were used as etching agents. Some of the initial gases (JF5 ClF3) and most of the reaction products (SiF4, SiCl4, ClF3, ClF) are infrared active. For this reason, online FTIR spectroscopy was applied as the analytical method during our static investigations on plasmaless and laser induced etching.

Paper Details

Date Published: 31 January 1994
PDF: 2 pages
Proc. SPIE 2089, 9th International Conference on Fourier Transform Spectroscopy, (31 January 1994); doi: 10.1117/12.166615
Show Author Affiliations
Andreas E. Guber, Kernforschungszentrum (Germany)
Uwe Koehler, Kernforschungszentrum Karlsruhe (Germany)
W. Bier, Kernforschungszentrum (Germany)


Published in SPIE Proceedings Vol. 2089:
9th International Conference on Fourier Transform Spectroscopy
John E. Bertie; Hal Wieser, Editor(s)

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