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Proceedings Paper

Fiber optics based in-situ FTIR monitoring of organometallic chemical vapor deposition of compound semiconductors
Author(s): Sateria Salim; C. K. Lim; Klavs F. Jensen; Richard D. Driver
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Paper Abstract

Optical fiber-based Fourier transform infrared (FTIR) is investigated as an in-situ monitoring tool for two applications in organometallic chemical vapor deposition (OMCVD): measurement of the concentration of organometallic precursors fed to the system, and detection of gas-phase reactions relevant to the process. The feasibility of the first application is demonstrated using fluoride fibers in case studies with trimethylindium and trimethylgallium. With a short single pass gas-cell, a minimum detection limit of 0.5% is achieved for a one minute scan time. Further reduction in this limit may be realized by improved cell design and longer scan times. The second application of the FTIR technique, in situ monitoring of gas-phase reactions, is also demonstrated. The results are in excellent agreement with previous reported data for the pyrolysis of the two precursors.

Paper Details

Date Published: 31 December 1993
PDF: 12 pages
Proc. SPIE 2069, Optical Methods for Chemical Process Control, (31 December 1993); doi: 10.1117/12.166282
Show Author Affiliations
Sateria Salim, Massachusetts Institute of Technology (United States)
C. K. Lim, Massachusetts Institute of Technology (United States)
Klavs F. Jensen, Massachusetts Institute of Technology (United States)
Richard D. Driver, Galileo Electro-Optics Corp. (United States)

Published in SPIE Proceedings Vol. 2069:
Optical Methods for Chemical Process Control
Stuart Farquharson; Jeremy M. Lerner, Editor(s)

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