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Proceedings Paper

Process monitoring during metalorganic chemical vapor deposition using FTIR spectroscopy
Author(s): Stuart Farquharson; Robert M. Carangelo; John R. Haigis; Philip W. Morrison; Peter R. Solomon; Peter S. Kirlin; Peter C. Van Buskirk
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Paper Abstract

The ability of Fourier transform infrared spectroscopy to perform in-situ measurements of ferroelectric thin film properties during metalorganic chemical vapor deposition is demonstrated. Infrared measurements of film reflectance and radiance allowed determination of film composition, thickness and temperature in real-time. These spectra could also be used to follow process changes, determine deposition rate, and extract the wavelength dependent dielectric function. These data, along with computer software and optical hardware developments, are presented.

Paper Details

Date Published: 31 December 1993
PDF: 9 pages
Proc. SPIE 2069, Optical Methods for Chemical Process Control, (31 December 1993); doi: 10.1117/12.166275
Show Author Affiliations
Stuart Farquharson, Advanced Fuel Research, Inc. (United States)
Robert M. Carangelo, Advanced Fuel Research, Inc. (United States)
John R. Haigis, Advanced Fuel Research, Inc. (United States)
Philip W. Morrison, Advanced Fuel Research, Inc. (United States)
Peter R. Solomon, Advanced Fuel Research, Inc. (United States)
Peter S. Kirlin, Advanced Technology Materials, Inc. (United States)
Peter C. Van Buskirk, Advanced Technology Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 2069:
Optical Methods for Chemical Process Control
Stuart Farquharson; Jeremy M. Lerner, Editor(s)

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