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Proceedings Paper

Refractive microlens arrays fabricated by reactive ion etching
Author(s): Margaret B. Stern; Theresa Rubico Jay
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Paper Abstract

Reactive ion etching (RIE) is used to fabricate infrared refractive micro-optics in silicon. Three methods are used: binary optics technology which uses iterative steps of photolithography and RIE to create a multistep approximation to an aspheric profile; direct etching of a preshaped polymer microlens etch mask into the substrate; and analog etching of a lens profile directly into the substrate through a pinhole mask.

Paper Details

Date Published: 15 December 1993
PDF: 10 pages
Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); doi: 10.1117/12.165699
Show Author Affiliations
Margaret B. Stern, Lincoln Lab./MIT (United States)
Theresa Rubico Jay, Lincoln Lab./MIT (United States)

Published in SPIE Proceedings Vol. 1992:
Miniature and Micro-Optics and Micromechanics
Neal C. Gallagher; Chandrasekhar Roychoudhuri, Editor(s)

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