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Proceedings Paper

Evolution of a microlens surface under etching conditions
Author(s): Edward John Gratrix
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Paper Abstract

This paper discusses the effects of an etching process on the optical figure of a microlens transferred from photoresist to an underlying substrate. I state a general equation for the evolution of a surface under etching conditions. I then show how isotropic and anisotropic etching conditions behave within this surface evolution theory. I demonstrate how ion milling is not an anisotropic process when eroding 3-D surfaces. Finally, I show that this behavior leads to aberrations in microlenses when subjected to ion milling as a pattern transfer technique.

Paper Details

Date Published: 15 December 1993
PDF: 9 pages
Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); doi: 10.1117/12.165697
Show Author Affiliations
Edward John Gratrix, Hughes Danbury Optical Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 1992:
Miniature and Micro-Optics and Micromechanics
Neal C. Gallagher; Chandrasekhar Roychoudhuri, Editor(s)

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