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Proceedings Paper

Monolithically integrated refractive optical interconnection networks
Author(s): Maria Kufner; Stefan Kufner; Michael Frank
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Paper Abstract

Deep etch lithography of PMMA by proton lithography is a powerful tool for the fabrication of monolithically integrated fully refractive microlenses, microprisms, and microbeamsplitters. This technique can be applied to many applications in the field of free space optical interconnects.

Paper Details

Date Published: 15 December 1993
PDF: 9 pages
Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); doi: 10.1117/12.165683
Show Author Affiliations
Maria Kufner, Ctr. Univ. d'Orsay (France)
Stefan Kufner, Ctr. Univ. d'Orsay (France)
Michael Frank, Univ. Erlangen-Nuernberg (Germany)

Published in SPIE Proceedings Vol. 1992:
Miniature and Micro-Optics and Micromechanics
Neal C. Gallagher; Chandrasekhar Roychoudhuri, Editor(s)

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