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Proceedings Paper

Making blazed holograms with the new REFO-125 photoresist
Author(s): Zishao Yang; Irina Menz; Guenther J. Dausmann
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Paper Abstract

A new photoresist (REFO-125) is developed especially for holography as well as diffractive optics. It is at least twice as sensitive as conventional photoresists in the spectral range of 350 nm - 520 nm. Using this resist holographic gratings with blazed surface relief profiles have been produced which show diffraction efficiencies of up to 90% for the blaze wavelengths. A theoretical model has been successfully used to determine the holographic recording geometries for various configurations of blazed gratings of transmission or reflection type. Experimental results show that the REFO-125 photoresist allows great modulation depths which are necessary especially for blazed transmission gratings.

Paper Details

Date Published: 12 January 1994
PDF: 4 pages
Proc. SPIE 2043, Holographic Imaging and Materials, (12 January 1994); doi: 10.1117/12.165593
Show Author Affiliations
Zishao Yang, Holographic Systems Munich GmbH (Germany)
Irina Menz, Holographic Systems Munich GmbH (Germany)
Guenther J. Dausmann, Holographic Systems Munich GmbH (Germany)


Published in SPIE Proceedings Vol. 2043:
Holographic Imaging and Materials
Tung H. Jeong, Editor(s)

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