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Proceedings Paper

In-position optical surface measurement for x-ray projection lithography optics: theory and simulation
Author(s): Eiichi Seya; Minoru Hidaka; Masaaki Ito; Souichi Katagiri; Eiji Takeda
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Paper Abstract

A technique is proposed to measure x-ray projection optics. Simultaneous linear equations are derived from the wavefront distortions to obtain form errors of optical surfaces discretely. Simulations proved that the arithmetic operation errors are small enough to achieve nanometer level accuracy. This technique is effective to test aspheric reflectors, as well as the reflector misalignments. It also is able to be applied to adaptive optics compensating for thermal deformation effects or drifts on the exposure system.

Paper Details

Date Published: 10 December 1993
PDF: 9 pages
Proc. SPIE 2003, Interferometry VI: Techniques and Analysis, (10 December 1993); doi: 10.1117/12.165471
Show Author Affiliations
Eiichi Seya, Hitachi Central Research Lab. (Japan)
Minoru Hidaka, Hitachi Central Research Lab. (Japan)
Masaaki Ito, Hitachi Central Research Lab. (Japan)
Souichi Katagiri, Hitachi Central Research Lab. (Japan)
Eiji Takeda, Hitachi Central Research Lab. (Japan)

Published in SPIE Proceedings Vol. 2003:
Interferometry VI: Techniques and Analysis
Osuk Y. Kwon; Gordon M. Brown; Malgorzata Kujawinska, Editor(s)

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