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Proceedings Paper

Photoresist as a recording material for holographic elements
Author(s): Miroslav Miler
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Paper Abstract

Photoresist, as one of the most important materials for recording holographic diffraction structures, is treated particularly from the point of view of a control of the development of the surface-relief profile of the grating groove. Primary attention is given to the formation of the desirable profile for the grating multiple beam splitter.

Paper Details

Date Published: 10 December 1993
PDF: 8 pages
Proc. SPIE 2108, International Conference on Holography, Correlation Optics, and Recording Materials, (10 December 1993); doi: 10.1117/12.165354
Show Author Affiliations
Miroslav Miler, Institute of Radio Engineering and Electronics (Czech Republic)


Published in SPIE Proceedings Vol. 2108:
International Conference on Holography, Correlation Optics, and Recording Materials
Oleg V. Angelsky, Editor(s)

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