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Proceedings Paper

Resulting profile of holographically recorded structures in photoresists
Author(s): Lucila H. D. Cescato; Bernardo M. de Assuncao Mello; Ivan F. da Costa; Carlos R. A. Lima
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Paper Abstract

A theoretical model is developed to compute the resulting profile of structures holographically recorded in photoresists. The model takes into account the effects of exposure, photosensitization and isotropy of wet development. The effects of isotropy of wet development, non-linearity of the photoresist response curve, background-light, and the stationary waves produced by reflection at the film-substrate interface are analyzed using the model and the results are experimentally confirmed.

Paper Details

Date Published: 6 December 1993
PDF: 10 pages
Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); doi: 10.1117/12.165228
Show Author Affiliations
Lucila H. D. Cescato, Univ. Estadual de Campinas (Brazil)
Bernardo M. de Assuncao Mello, Univ. Estadual de Campinas (Brazil)
Ivan F. da Costa, Univ. Estadual de Campinas (Brazil)
Carlos R. A. Lima, Univ. Estadual de Campinas (Brazil)


Published in SPIE Proceedings Vol. 2018:
Passive Materials for Optical Elements II
Gary W. Wilkerson, Editor(s)

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