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Proceedings Paper

Radiation damage effects in far-ultraviolet filters and substrates
Author(s): Charles E. Keffer; Marsha R. Torr; Muamer Zukic; James F. Spann; Douglas G. Torr; Jongmin Kim
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Paper Abstract

New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 RE orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials on the thin film format, we report on such an assessment here.

Paper Details

Date Published: 6 December 1993
PDF: 12 pages
Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); doi: 10.1117/12.165218
Show Author Affiliations
Charles E. Keffer, Univ. of Alabama in Huntsville (United States)
Marsha R. Torr, NASA Marshall Space Flight Ctr. (United States)
Muamer Zukic, Univ. of Alabama in Huntsville (United States)
James F. Spann, NASA Marshall Space Flight Ctr. (United States)
Douglas G. Torr, Univ. of Alabama in Huntsville (United States)
Jongmin Kim, Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 2018:
Passive Materials for Optical Elements II
Gary W. Wilkerson, Editor(s)

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