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Proceedings Paper

Employment of design of experiment for optimized development of thin film coatings
Author(s): Alan C. Barron; Charles M. Kennemore III; Albert F. Slomba; Fred J. Van Milligen
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Paper Abstract

Design of experiment (DOE) methods were employed to optimally develop thin films with respect to optical absorption and mechanical stress performance. The goal of the experiment was to identify key deposition characteristics which would yield very low optical absorption and minimized film stress characteristics. A fractional factorial matrix was utilized for the preliminary portion of the experiment. Key deposition parameters with respect to low absorption and low film stress were identified as a result of the DOE effort. In addition, the interaction effects of each key deposition parameter with other key deposition parameters as a function of performance were identified. Details of the DOE setup, analysis, and evaluation are presented. Subsequent application of statistical process control methods to control these optimized critical parameters during production to ensure consistent, high quality production yields are discussed.

Paper Details

Date Published: 7 December 1993
PDF: 6 pages
Proc. SPIE 1993, Quality and Reliability for Optical Systems, (7 December 1993); doi: 10.1117/12.164980
Show Author Affiliations
Alan C. Barron, United Technologies Optical Systems (United States)
Charles M. Kennemore III, United Technologies Optical Systems (United States)
Albert F. Slomba, United Technologies Optical Systems (United States)
Fred J. Van Milligen, United Technologies Optical Systems (United States)

Published in SPIE Proceedings Vol. 1993:
Quality and Reliability for Optical Systems
James W. Bilbro; Robert E. Parks, Editor(s)

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